The new low-temperature process enables fabrication of a large variety of nanoscale quartz glass structures. (Figure: Dr. Jens Bauer, KIT). Credit: Dr. Jens Bauer, KIT
Printing of micro- and nanometer-scaled quartz glass structures from pure silicon dioxide opens up many new applications in optics, photonics, and semiconductor technologies. So far, processes have been based on conventional sintering.
Temperatures required for sintering silicon dioxide nanoparticles are above 1100°C, which is much too hot for direct deposition onto semiconducting chips. A team headed by Dr. Jens Bauer from KIT’s Institute of Nanotechnology (INT) has now developed a new process to produce transparent …
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